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Proceedings Paper

Acid-base equilibrium in chemically amplified resist
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Paper Abstract

In chemically amplified resists, amines (base compounds) play important roles such as the control of acid diffusion, the sharpening of image slope and the improvement of environmental resistivity of resist materials. However, the details in the reactions between amines and protons in solid films are still unknown. In this research, we have investigated the neutralization of acids by amines in poly(4-hydroxystyrene) (PHS). Proton dynamics in the presence of amines in PHS films is discussed.

Paper Details

Date Published: 26 March 2008
PDF: 8 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231A (26 March 2008); doi: 10.1117/12.772165
Show Author Affiliations
Kenichiro Natsuda, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Kazumasa Okamoto, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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