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Proceedings Paper

Acid-base equilibrium in chemically amplified resist
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Paper Details

Date Published: 26 March 2008
PDF: 8 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231A (26 March 2008); doi: 10.1117/12.772165
Show Author Affiliations
Kenichiro Natsuda, Osaka Univ. (Japan)
Takahiro Kozawa, Osaka Univ. (Japan)
Kazumasa Okamoto, Osaka Univ. (Japan)
Seiichi Tagawa, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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