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Proceedings Paper

Challenges of OPC model calibration from SEM contours
Author(s): Yuri Granik; Ir Kusnadi
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Paper Abstract

Traditionally OPC models are calibrated to match CD measurements from selected test pattern locations. This demand for massive CD data drives advances in metrology. Considerable progress has recently been achieved in complimenting this CD data with SEM contours. Here we propose solutions to some challenges that emerge in calibrating OPC models from the experimental contours. We discuss and state the minimization objective as a measure of the distance between simulation and experimental contours. The main challenge is to correctly process inevitable gaps, discontinuities and roughness of the SEM contours. We discuss standardizing the data interchange formats and procedures between OPC and metrology vendors.

Paper Details

Date Published: 24 March 2008
PDF: 8 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221H (24 March 2008); doi: 10.1117/12.772060
Show Author Affiliations
Yuri Granik, Mentor Graphics Corp. (United States)
Ir Kusnadi, Mentor Graphics Corp. (United States)

Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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