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Proceedings Paper

DfM lessons learned from altPSM design
Author(s): Lars Liebmann; Zak Baum; Ioana Graur; Don Samuels
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Paper Abstract

The design challenges associated with alternating phase shifted mask lithography are discussed, solutions which had been developed to address these challenges are reviewed, and parallels to current design for manufacturability implementation issues are identified. Leveraging these insights, the positive attributes of a well integrated design for manufacturability enhanced design flow are proposed. Specific topics covered in the paper are: the need to complement error-detection with streamlined layout-correction, the risk of providing too much unstable information too early in the design optimization flow, the efficiencies of prescriptive 'correct-by-construction' solutions, and the need for seamless integration into existing design flows. For the benefit of the non-lithographer, the discussion of these detailed topics is preceded by a brief review of alternating phase shifted mask lithography principles and benefits.

Paper Details

Date Published: 4 March 2008
PDF: 9 pages
Proc. SPIE 6925, Design for Manufacturability through Design-Process Integration II, 69250C (4 March 2008); doi: 10.1117/12.771974
Show Author Affiliations
Lars Liebmann, IBM Microelectronics (United States)
Zak Baum, IBM Microelectronics (United States)
Ioana Graur, IBM Microelectronics (United States)
Don Samuels, IBM Microelectronics (United States)


Published in SPIE Proceedings Vol. 6925:
Design for Manufacturability through Design-Process Integration II
Vivek K. Singh; Michael L. Rieger, Editor(s)

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