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Proceedings Paper

Optimization procedure of exposure tools with polarization aberrations
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Paper Abstract

In the Hyper-NA immersion age, it is essential to optimize all optical parameters, and so exposure tools must have functions to precisely control the parameters. There have been various reports indicating that polarization aberrations of projection optics affect imaging performance, but there have been few reports on reducing their influence in tools. We have developed a new method to optimize imaging performance with polarization taken into account. This paper describes a theoretical analysis of polarization with Pauli decomposition. A strict vectorial calculation of optical images matches our expression. Then, our solver software can determine the optimum conditions of all aberration parameters of exposure tools for specific IC patterns.

Paper Details

Date Published: 1 April 2008
PDF: 10 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69241I (1 April 2008); doi: 10.1117/12.771962
Show Author Affiliations
Tadashi Arai, Canon, Inc. (Japan)
Akihiro Yamada, Canon, Inc. (Japan)
Kenichiro Mori, Canon, Inc. (Japan)
Yoshinori Osaki, Canon, Inc. (Japan)
Toshiyuki Yoshihara, Canon, Inc. (Japan)
Yasuo Hasegawa, Canon, Inc. (Japan)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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