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Proceedings Paper

CO2 laser-produced Sn-plasma source for high-volume manufacturing EUV lithography
Author(s): Akira Endo; Hideo Hoshino; Takashi Suganuma; Krzysztof Nowak; Tatsuya Yanagida; Takayuki Yabu; Takeshi Asayama; Yoshifumi Ueno; Masato Moriya; Masaki Nakano; Hiroshi Someya; Toshihiro Nishisaka; Tamotsu Abe; Georg Soumagne; Hiroshi Komori; Hakaru Mizoguchi; Akira Sumitani; Koichi Toyoda
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Paper Abstract

We are developing a laser produced plasma light source for high volume manufacturing (HVM) EUV lithography. The light source is based on a high power, high repetition rate CO2 laser system, a tin target and a magnetic ion guiding for tin treatment. The laser system is a master oscillator power amplifier (MOPA) configuration. We have achieved an average laser output power of 10 kW at 100 kHz by a single laser beam with good beam quality. EUV in-band power equivalent to 60 W at intermediate focus was produced by irradiating a tin rotating plate with 6 kW laser power. This light source is scalable to more than 200 W EUV in-band power based on a 20-kW CO2 laser. Collector mirror life can be extended by using droplet target and magnetic ion guiding. Effectiveness of the magnetic ion guiding is examined by monitoring the motion of fast Sn ion in a large vacuum chamber with a maximum magnetic flux density of 2 T.

Paper Details

Date Published: 20 March 2008
PDF: 7 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69210T (20 March 2008); doi: 10.1117/12.771959
Show Author Affiliations
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Hideo Hoshino, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Krzysztof Nowak, Extreme Ultraviolet Lithography System Development Association (Japan)
Tatsuya Yanagida, Extreme Ultraviolet Lithography System Development Association (Japan)
Takayuki Yabu, Extreme Ultraviolet Lithography System Development Association (Japan)
Takeshi Asayama, Extreme Ultraviolet Lithography System Development Association (Japan)
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Masato Moriya, Extreme Ultraviolet Lithography System Development Association (Japan)
Masaki Nakano, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Someya, Extreme Ultraviolet Lithography System Development Association (Japan)
Toshihiro Nishisaka, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Hakaru Mizoguchi, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)
Koichi Toyoda, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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