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Proceedings Paper

Advanced CD-SEM metrology to improve total process control performance for hyper-NA lithography
Author(s): Mayuka Osaki; Maki Tanaka; Chie Shishido; Toru Ishimoto; Norio Hasegawa; Kohei Sekiguchi; Kenji Watanabe; Shaunee Cheng; David Laidler; Monique Ercken; Efrain Altamirano
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Paper Abstract

In this research, we improved litho process monitor performance with CD-SEM for hyper-NA lithography. First, by comparing litho and etch process windows, it was confirmed that litho process monitor performance is insufficient just by CD measurement because of litho-etch CD bias variation. Then we investigated the impact of the changing resist profile on litho-etch CD bias variation by cross-sectional observation. As a result, it was determined that resist loss and footing variation cause litho-etch CD bias variation. Then, we proposed a measurement method to detect the resist loss variation from top-down SEM image. Proposed resist loss measurement method had good linearity to detect resist loss variation. At the end, threshold of resist loss index for litho process monitor was determined as to detect litho-etch CD bias variation. Then we confirmed that with the proposed resist loss measurement method, the litho process monitor performance was improved by detection of litho-etch CD bias variation in the same throughput as CD measurement.

Paper Details

Date Published: 16 April 2008
PDF: 12 pages
Proc. SPIE 6922, Metrology, Inspection, and Process Control for Microlithography XXII, 69221B (16 April 2008); doi: 10.1117/12.771886
Show Author Affiliations
Mayuka Osaki, Hitachi, Ltd. (Japan)
IMEC vzw (Belgium)
Maki Tanaka, Hitachi, Ltd. (Japan)
Chie Shishido, Hitachi, Ltd. (Japan)
Toru Ishimoto, Hitachi High-Technologies Corp. (Belgium)
IMEC vzw (Belgium)
Norio Hasegawa, Hitachi High-Technologies Corp. (Japan)
Kohei Sekiguchi, Hitachi High-Technologies Europe GmbH (Germany)
IMEC vzw (Belgium)
Kenji Watanabe, Hitachi High-Technologies Corp. (Japan)
Shaunee Cheng, IMEC vzw (Belgium)
David Laidler, IMEC vzw (Belgium)
Monique Ercken, IMEC vzw (Belgium)
Efrain Altamirano, IMEC vzw (Belgium)

Published in SPIE Proceedings Vol. 6922:
Metrology, Inspection, and Process Control for Microlithography XXII
John A. Allgair; Christopher J. Raymond, Editor(s)

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