Share Email Print
cover

Proceedings Paper

General imaging of advanced 3D mask objects based on the fully-vectorial extended Nijboer-Zernike (ENZ) theory
Author(s): Sven van Haver; Olaf T. A. Janssen; Joseph J. M. Braat; Augustus J. E. M. Janssen; H. Paul Urbach; Silvania F. Pereira
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

In this paper we introduce a new mask imaging algorithm that is based on the source point integration method (or Abbe method). The method presented here distinguishes itself from existing methods by exploiting the through-focus imaging feature of the Extended Nijboer-Zernike (ENZ) theory of diffraction. An introduction to ENZ-theory and its application in general imaging is provided after which we describe the mask imaging scheme that can be derived from it. The remainder of the paper is devoted to illustrating the advantages of the new method over existing methods (Hopkins-based). To this extent several simulation results are included that illustrate advantages arising from: the accurate incorporation of isolated structures, the rigorous treatment of the object (mask topography) and the fully vectorial through-focus image formation of the ENZ-based algorithm.

Paper Details

Date Published: 7 March 2008
PDF: 8 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69240U (7 March 2008); doi: 10.1117/12.771872
Show Author Affiliations
Sven van Haver, Delft Univ. of Technology (Netherlands)
Olaf T. A. Janssen, Delft Univ. of Technology (Netherlands)
Joseph J. M. Braat, Delft Univ. of Technology (Netherlands)
Augustus J. E. M. Janssen, Philips Research Europe (Netherlands)
H. Paul Urbach, Delft Univ. of Technology (Netherlands)
Silvania F. Pereira, Delft Univ. of Technology (Netherlands)


Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

© SPIE. Terms of Use
Back to Top