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Proceedings Paper

Magnetic debris mitigation of a CO2 laser-produced Sn plasma
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Paper Abstract

We evaluated the characteristics of Sn debris generated by a CO2 laser (10.6μm) produced plasma. Experiments were performed with bulk Sn-plate targets and Mo/Si multilayer mirror samples were used for debris analysis. We observed very thin and uniform Sn layers of nano/sub-nano size debris particles. The layer deposition rate at 120mm from the plasma is, without magnetic field, about 30nm per million shots. The fundamental magnetic field effect has been confirmed experimentally. The fast Sn ion flux was measured with Faraday cups and the signal decreased by more than 3 orders of magnitude applying a magnetic field of 1T. The Sn deposition on the Mo/Si multilayer mirror decreased in this case by a factor of 4. The contribution of the remaining neutral Sn particles is under study in order to decrease the deposition rate.

Paper Details

Date Published: 21 March 2008
PDF: 10 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212Z (21 March 2008); doi: 10.1117/12.771817
Show Author Affiliations
Yoshifumi Ueno, Extreme Ultraviolet Lithography System Development Association (Japan)
Georg Soumagne, Extreme Ultraviolet Lithography System Development Association (Japan)
Masato Moriya, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Suganuma, Extreme Ultraviolet Lithography System Development Association (Japan)
Tamotsu Abe, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiroshi Komori, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Endo, Extreme Ultraviolet Lithography System Development Association (Japan)
Akira Sumitani, Extreme Ultraviolet Lithography System Development Association (Japan)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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