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Proceedings Paper

Extreme mask corrections: technology and benefits
Author(s): Yuri Granik; Nick Cobb; Dmitry Medvedev
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Paper Abstract

We establish criteria to recognize extreme OPC corrections and discuss their difference from the traditional corrections. Then we present new proximity correction methods for rigorous bi- and tri- tone mask optimization that cast problem as a constraint minimization over the space of piecewise constant or continuous functions. The primary optimization objective is stated as a contour integral over the target. The constraints on image amplitude form convex functionals for dark areas and non-convex functionals for bright areas. A Lagrangian of this constrained problem is minimized. This delivers extreme, aggressive mask corrections, which are not confined by the fragmentation schema or the orientation of its sites. We analyze performance of these corrections under challenging process conditions and evaluate fidelity benefits.

Paper Details

Date Published: 7 March 2008
PDF: 15 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69243W (7 March 2008); doi: 10.1117/12.771784
Show Author Affiliations
Yuri Granik, Mentor Graphics Corp. (United States)
Nick Cobb, Mentor Graphics Corp. (United States)
Dmitry Medvedev, Mentor Graphics Corp. (United States)


Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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