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Proceedings Paper

Novel spin-on organic hardmask with high plasma etch resistance
Author(s): Chang-Il Oh; Jin-Kuk Lee; Min-Soo Kim; Kyong-Ho Yoon; Hwan-Sung Cheon; Nataliya Tokareva; Jee-Yun Song; Jong-Seob Kim; Tu-Won Chang
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Paper Abstract

In recent years for memory devices under 70nm using ArF lithography, spin-on organic hardmask has become an attractive alternative process to amorphous carbon layer hardmark (ACL) in mass production due to ACL hardmask's limited capacity, high cost-of-ownership, and low process efficiency in spite of its excellent etch performance. However, insufficient plasma etch resistance of spin-on hardmask makes the etch process an issue resulting in inadequate vertical profiles, large CD bias, and narrow etch process window compared to ACL hardmask. In order to be able to apply these spin on hardmasks to varies layers including critical layers, the aforementioned problems need to be resolved and verified using several evaluation methods including etch pattern evaluation. In this paper, we report the synthesis of novel organic spin-on hardmasks (C-SOH) that incorporate various fused aromatic moieties into polymer chain and the evaluation of etch performance using dry etch tools. Organic spin-on hardmasks with 79-90 wt% carbon contents were synthesized in-house. Oxygen and fluorine based plasma etch processes were used to evaluate the etch resistance of the C-SOH. The results show our 3rd generation C-SOH has etch profiles comparable to that of ACL in a 1:1 dense pattern.

Paper Details

Date Published: 26 March 2008
PDF: 8 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69232V (26 March 2008); doi: 10.1117/12.771758
Show Author Affiliations
Chang-Il Oh, Cheil Industries Inc. (South Korea)
Jin-Kuk Lee, Cheil Industries Inc. (South Korea)
Min-Soo Kim, Cheil Industries Inc. (South Korea)
Kyong-Ho Yoon, Cheil Industries Inc. (South Korea)
Hwan-Sung Cheon, Cheil Industries Inc. (South Korea)
Nataliya Tokareva, Cheil Industries Inc. (South Korea)
Jee-Yun Song, Cheil Industries Inc. (South Korea)
Jong-Seob Kim, Cheil Industries Inc. (South Korea)
Tu-Won Chang, Cheil Industries Inc. (South Korea)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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