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Proceedings Paper

Shaped beam technique using a novel 3rd-order imaging approach
Author(s): Tadashi Kotsugi; Takashi Fuse; Hidetoshi Kinoshita; N. William Parker
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Paper Abstract

We investigate a new technique for high current density beam formation called 3rd order imaging. This technique has two advantages: 1) increasing the beam current without beam blurring, and 2) producing a desired beam shape, such as a square or rectangle. Thus, it can significantly decrease writing times in Electron Beam Direct Writing (EBDW). These advantages are realized by using a patterned beam-defining aperture (PBDA) whose patterned openings work with the spherical aberration in the objective lens to generate the final beam shape. The PBDA transmits rays if they fall within the desired shape at the wafer, while blocking rays which would fall outside the desired shape. We have obtained beam line profiles and two-dimensional beam shapes experimentally. The 3rd-order imaging beam current density is seven times larger than that of a beam shaped by the conventional aperture. The experimental beam profile and the calculated result are in good agreement. The experimental two-dimensional shapes reproduce the calculated beam shapes, thereby verifying the theory of 3rd-order imaging. This technique is a potential solution to break through the technological impasse of high current density versus high resolution.

Paper Details

Date Published: 20 March 2008
PDF: 8 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69211V (20 March 2008); doi: 10.1117/12.771753
Show Author Affiliations
Tadashi Kotsugi, Tokyo Electron Ltd. (Japan)
Takashi Fuse, Tokyo Electron Ltd. (Japan)
Hidetoshi Kinoshita, Tokyo Electron Ltd. (Japan)
N. William Parker, Multibeam Systems Inc. (United States)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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