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Proceedings Paper

Polymer matrix effects on acid generation
Author(s): Theodore H. Fedynyshyn; Russell B. Goodman; Jeanette Roberts
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Paper Abstract

We have measured the acid generation efficiency with EUV exposure of a PAG in different polymer matrixes representing the main classes of resist polymers as well as some previously described fluoropolymers for lithographic applications. The polymer matrix was found to have a significant effect on the acid generation efficiency of the PAG studied. A linear relationship exists between the absorbance of the resist and the acid generation efficiency. A second inverse relationship exists between Dill C and aromatic content of the resist polymer. It was shown that polymer sensitization is important for acid generation with EUV exposure and the Dill C parameter can be increased by up to five times with highly absorbing non-aromatic polymers, such as non-aromatic fluoropolymers, over an ESCAP polymer. The increase in the Dill C value will lead to an up to five fold increase in resist sensitivity. It is our expectation that these insights into the nature of polymer matrix effects on acid generation could lead to increased sensitivity for EUV resists.

Paper Details

Date Published: 26 March 2008
PDF: 12 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 692319 (26 March 2008); doi: 10.1117/12.771692
Show Author Affiliations
Theodore H. Fedynyshyn, MIT Lincoln Lab. (United States)
Russell B. Goodman, MIT Lincoln Lab. (United States)
Jeanette Roberts, Intel Corp. (United States)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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