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Proceedings Paper

NIL mold manufacturing using self-organized diblock copolymer as patterning template
Author(s): Naoko Kihara; Hiroyuki Hieda; Katsuyuki Naito
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Paper Abstract

A low-cost fabrication method combining self-organized lithography and nanoimprint is proposed as a possible solution for patterned media production for the memory density beyond 1 Tbpsi. For that purpose, imprint mold equipped with 30-nm-pitch pillar pattern was formed on a Si substrate using diblock copolymer template. Room-temperature imprint and ion milling were applied to avoid thermal and chemical damage to magnetic film during a patterning process. The obtained aspect ratio of the relief by room-temperature imprint was enhanced via pattern-inverse process. After ionmilling treatment, 30-nm-pitch magnetic dot array with 20 nm height was observed. A nickel replica mold was formed by electroforming applying the Si mold as an original master. These results indicate the possibility that nanoimprinting is a practical method for 1 Tbpsi patterned media production.

Paper Details

Date Published: 20 March 2008
PDF: 8 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 692126 (20 March 2008); doi: 10.1117/12.771630
Show Author Affiliations
Naoko Kihara, Toshiba Corp. (Japan)
Hiroyuki Hieda, Toshiba Corp. (Japan)
Katsuyuki Naito, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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