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Proceedings Paper

Studies of high index immersion lithography
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Paper Abstract

High index immersion lithography is one of the candidates for next generation lithography technology following water immersion lithography. This technology may be most attractive for the industry since it is effective in raising resolution without seriously changing the chip making processes. This motivates us to continue to study further NA expansion although there are many challenges with respect to either high index fluid development or high index lens material development. In this paper, the current status of high index lithography development compared with the industry's requirements is discussed while considering design feasibility.

Paper Details

Date Published: 7 March 2008
PDF: 8 pages
Proc. SPIE 6924, Optical Microlithography XXI, 692413 (7 March 2008); doi: 10.1117/12.771622
Show Author Affiliations
Yasuhiro Ohmura, Nikon Corp. (Japan)
Hiroyuki Nagasaka, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Toshiharu Nakashima, Nikon Corp. (Japan)
Teruki Kobayashi, Nikon Corp. (Japan)
Motoi Ueda, Nikon Corp. (Japan)
Soichi Owa, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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