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Proceedings Paper

Characterization of extreme ultraviolet emission from tin-droplets irradiated with Nd:YAG laser plasmas
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Paper Abstract

EUV emission from spherical and planer targets were precisely characterized as an experimental database for use in EUV source generation at high repetition rates. In the single-shot base experiments, conversion efficiency as high as those for the plasma geometry has been demonstrated. The integrated experiment was made with 10 Hz plasma generation.

Paper Details

Date Published: 21 March 2008
PDF: 8 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69212T (21 March 2008); doi: 10.1117/12.771536
Show Author Affiliations
Tatsuya Aota, Osaka Univ. (Japan)
Yuki Nakai, Osaka Univ. (Japan)
Shinsuke Fujioka, Osaka Univ. (Japan)
Etsuo Fujiwara, Univ. of Hyogo (Japan)
Masashi Shimomura, Osaka Univ. (Japan)
Hiroaki Nishimura, Osaka Univ. (Japan)
Nobukatsu Nishihara, Osaka Univ. (Japan)
Noriaki Miyanaga, Osaka Univ. (Japan)
Yasukazu Izawa, Osaka Univ. (Japan)
Kunioki Mima, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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