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Proceedings Paper

Impact of optimization conditions on the result at optimizing illumination and mask
Author(s): Koichiro Tsujita; Koji Mikami; Hiroyuki Ishii; Akiyoshi Suzuki
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Paper Abstract

Illumination for SRAM device pattern with peripheral circuit is optimized applying OPC during optimization. At first the memory cell is targeted, next library patterns that represent the peripheral circuit are added as the targets one by one, and it is investigated how the optimized illumination varies. As optimized targets ILS and dose-focus window are used. For the case of ILS the optimized illumination shapes become milder as more patterns are evaluated and the OPC result becomes weaker correspondingly. For the case of window the tendency is similar but not so intense. The illuminations optimized by ILS and window are different. The optimized illuminations by optical and resist simulation are a little different. As practical application illumination defined by functions such as annular is evaluated, where the information of actual scanners are applied. At first 1/4 divided polarization plate is used instead of tangential polarization. Secondly illumination is searched in the solution space that consists of hardware design instead of numerical expression. By introducing the information the optimized illuminations are varied. From these results it turns out that the optimization tool should handle the information of actual scanners properly. And we have developed the solution tool (k1-TUNE).

Paper Details

Date Published: 7 March 2008
PDF: 12 pages
Proc. SPIE 6924, Optical Microlithography XXI, 69242U (7 March 2008); doi: 10.1117/12.771369
Show Author Affiliations
Koichiro Tsujita, Canon, Inc. (Japan)
Koji Mikami, Canon, Inc. (Japan)
Hiroyuki Ishii, Canon, Inc. (Japan)
Akiyoshi Suzuki, Canon, Inc. (Japan)


Published in SPIE Proceedings Vol. 6924:
Optical Microlithography XXI
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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