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Proceedings Paper

Mask CD control (CDC) with ultrafast laser for improving mask CDU using AIMS as the CD metrology data source
Author(s): Guy Ben-Zvi; Eitan Zait; Vladimir Dmitriev; Erez Graitzer; Gidi Gottlieb; Lior Leibovich; Robert Birkner; Klaus Boehm; Thomas Scheruebl
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Paper Abstract

CD uniformity control by ultrafast laser system writing inside the bulk of photomasks has previously been shown to be an effective method for local CD Control (CDC) [1]. Intra-field CD variations correction has been implemented effectively in mask-shops and fabs based on CDC SEM [2, 3] and OCD as the CD data source. Using wafer CD data allows correction of all wafer field CD contributors at once, but does not allow correcting for mask CD signature alone. In case of a mask shop attempting to improve CDU of the mask regardless of a particular exposure tool, it is a better practice to use mask CD data by itself as the CD data source. We propose using an aerial imaging system AIMSTM45-193i as the mask CD data source for the CDC process. In this study we created a programmed CD mask (65nm dense L/S) with relatively large CD errors. The programmed CD mask was then measured by AIMSTM45-193i (AIMS45) which defined the CDU map of the programmed CD mask. The CDU data from AIMSTM45-193i was then used by Pixer CDC101 to correct the CDU and bring it back to a flat almost ideal CDU.

Paper Details

Date Published: 31 October 2007
PDF: 9 pages
Proc. SPIE 6730, Photomask Technology 2007, 67304X (31 October 2007); doi: 10.1117/12.771190
Show Author Affiliations
Guy Ben-Zvi, Pixer Technology (Israel)
Eitan Zait, Pixer Technology (Israel)
Vladimir Dmitriev, Pixer Technology (Israel)
Erez Graitzer, Pixer Technology (Israel)
Gidi Gottlieb, Pixer Technology (Israel)
Lior Leibovich, Pixer Technology (Israel)
Robert Birkner, Carl Zeiss SMS GmbH (Germany)
Klaus Boehm, Carl Zeiss SMS GmbH (Germany)
Thomas Scheruebl, Carl Zeiss SMS GmbH (Germany)

Published in SPIE Proceedings Vol. 6730:
Photomask Technology 2007
Robert J. Naber; Hiroichi Kawahira, Editor(s)

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