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Proceedings Paper

Synthesis and evaluation of novel resist monomers and copolymers for ArF lithography: Part II
Author(s): Osamu Nakayama; Takashi Fukumoto; Miki Tachibana; Junko Sato; Masahiko Kitayama; Tsuyoshi Kajiyashiki
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Paper Abstract

We synthesized several new monomers with an acid-cleavable protective group and investigated their deprotection reactions. Polymers were prepared using these monomers, and their thermal properties and dissolution rates were investigated. The acidic reactivity of protective groups of these monomers was evaluated using a method we developed. The activation energies [Ea(experimental)] calculated using reaction rate constants were found to correlate to some extent with the activation energies [Ea(calculated)] calculated from MOPAC. The dissolution rates of some polymers containing similar protective groups as structures were measured. The dissolution rates were related to the polarity and molecular volume (MV) of the decomposed products of protective groups.

Paper Details

Date Published: 15 April 2008
PDF: 8 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69233F (15 April 2008); doi: 10.1117/12.771130
Show Author Affiliations
Osamu Nakayama, Kuraray Co., Ltd. (Japan)
Takashi Fukumoto, Kuraray Co., Ltd. (Japan)
Miki Tachibana, Kuraray Co., Ltd. (Japan)
Junko Sato, Kuraray Co., Ltd. (Japan)
Masahiko Kitayama, Kuraray Co., Ltd. (Japan)
Tsuyoshi Kajiyashiki, Kuraray Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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