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Proceedings Paper

All-dry photoresist systems: physical vapor deposition of molecular glasses
Author(s): Frauke Pfeiffer; Christian Neuber; Hans-Werner Schmidt
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Paper Abstract

The aim of the paper is the development of an all-dry photolithographic process in which the film preparation step as well as the development step is performed without the use of solvent. To implement an all-dry photoresist system we focused on coumarin derivatives, as this class can be photodimerized in the solid state and features sufficient high thermal stability. The dimerized product exhibits sufficiently different physical properties. The monomer can be evaporated at elevated temperatures whereas the dimerized product remains non-volatile under these conditions. With a tailored glass forming coumarin derivative we demonstrated the capability to develop clear patterns. A combinatorial approach, i.e. producing a compositional library in combination with the variation of exposure dose was utilized to efficiently optimize the all-dry photoresist system.

Paper Details

Date Published: 26 March 2008
PDF: 8 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231F (26 March 2008); doi: 10.1117/12.771101
Show Author Affiliations
Frauke Pfeiffer, Univ. Bayreuth (Germany)
Christian Neuber, Univ. Bayreuth (Germany)
Hans-Werner Schmidt, Univ. Bayreuth (Germany)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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