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Proceedings Paper

Novel molecular resist based on an amorphous truxene derivative
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Paper Abstract

A novel molecular resist based on a new amorphous molecule, a truxene derivative, was designed and synthesized. Truxene is characterized as an amorphous solid with a high glass transition temperature (Tg). 70 nm line-and-space (1 : 1) positive pattern was fabricated by the exposure of a low-energy electron beam (5 keV) using the new molecular resist. The new molecular design of resists based on the truxene derivative is promising with regard to development of more efficient molecular resists.

Paper Details

Date Published: 26 March 2008
PDF: 12 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69230J (26 March 2008); doi: 10.1117/12.770944
Show Author Affiliations
Shigeki Hattori, Toshiba Corp. (Japan)
Satoshi Saito, Toshiba Corp. (Japan)
Koji Asakawa, Toshiba Corp. (Japan)
Takeshi Koshiba, Toshiba Corp. (Japan)
Tetsuro Nakasugi, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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