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Proceedings Paper

High refractive-index resists composed of anionic photoacid generator (PAG) bound polymers for 193 nm immersion lithography
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Paper Abstract

The objective of to develop high refractive index (HRI) chemical amplified resists (CAR), which are composed of HRI photoacid generator (PAG) bound polymer resists, and incorporate HRI nanoparticles into the polymer matrix. Therefore, this new series of nanocomposite resists should be effective for 193 nm immersion lithography with high RI, to obtain feature sizes down to 32 nm or lower.

Paper Details

Date Published: 26 March 2008
PDF: 7 pages
Proc. SPIE 6923, Advances in Resist Materials and Processing Technology XXV, 69231P (26 March 2008); doi: 10.1117/12.770458
Show Author Affiliations
Kenneth E. Gonsalves, Univ. of North Carolina at Charlotte (United States)
Mingxing Wang, Univ. of North Carolina at Charlotte (United States)
Narahari S. Pujari, Univ. of North Carolina at Charlotte (United States)


Published in SPIE Proceedings Vol. 6923:
Advances in Resist Materials and Processing Technology XXV
Clifford L. Henderson, Editor(s)

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