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Proceedings Paper

Phenomenological analysis of carbon deposition rate on the multilayer mirror
Author(s): Takahiro Nakayama; Hiromitsu Takase; Shigeru Terashima; Takashi Sudo; Yutaka Watanabe; Yasuaki Fukuda; Katsuhiko Murakami; Shintaro Kawata; Takashi Aoki; Shuichi Matsunari; Yukinobu Kakutani; Masahito Niibe
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Paper Abstract

It is very important to mitigate oxidation of multilayer mirrors (MLMs) and carbon deposition onto MLMs to extend the lifetime of EUV exposure tool. We focused on carbon deposition on Si-capped multilayer mirror. We made experiments of EUV irradiation to the multilayer mirrors using an EUV irradiation apparatus connected to a beam line (SBL -2) of synchrotron radiation facility Super-ALIS in the NTT Atsugi research and development center. Thickness of deposited carbon was obtained by using XPS. We investigated carbon deposition rates at various partial pressures of various organic species. Phenomenological analysis was applied to the obtained carbon deposition rate. Carbon deposition rate was proportional to the pressure at the proportional EUV intensity. Applying this normalization of the deposition rate and the EUV intensity, carbon deposition rate seems to behave according to each universal function for each hydrocarbon species.

Paper Details

Date Published: 21 March 2008
PDF: 9 pages
Proc. SPIE 6921, Emerging Lithographic Technologies XII, 69213B (21 March 2008); doi: 10.1117/12.769958
Show Author Affiliations
Takahiro Nakayama, Extreme Ultraviolet Lithography System Development Association (Japan)
Hiromitsu Takase, Extreme Ultraviolet Lithography System Development Association (Japan)
Shigeru Terashima, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Sudo, Extreme Ultraviolet Lithography System Development Association (Japan)
Yutaka Watanabe, Extreme Ultraviolet Lithography System Development Association (Japan)
Yasuaki Fukuda, Extreme Ultraviolet Lithography System Development Association (Japan)
Katsuhiko Murakami, Extreme Ultraviolet Lithography System Development Association (Japan)
Shintaro Kawata, Extreme Ultraviolet Lithography System Development Association (Japan)
Takashi Aoki, Extreme Ultraviolet Lithography System Development Association (Japan)
Shuichi Matsunari, Extreme Ultraviolet Lithography System Development Association (Japan)
Yukinobu Kakutani, Extreme Ultraviolet Lithography System Development Association (Japan)
Masahito Niibe, Univ. of Hyogo (Japan)


Published in SPIE Proceedings Vol. 6921:
Emerging Lithographic Technologies XII
Frank M. Schellenberg, Editor(s)

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