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Proceedings Paper

Spin-on-glass smoothing of diamond turned optics for use in the extreme ultraviolet regime
Author(s): Farhad Salmassi; Christopher N. Anderson; Eric M. Gullikson; Patrick P. Naulleau
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Paper Abstract

Mirror substrates intended for use in the extreme ultraviolet (EUV) regime have exceedingly stringent requirements on surface finish. Rendering a substrate reflective at EUV wavelength and near normal angles of incidence requires these mirrors to be coated with high-quality multilayer coatings forming a Bragg reflector. These coatings typically have period requirements on the order of 7 nm. It is evident that any appreciable roughness on this scale would destroy the resonant behavior the Bragg structures significantly degrading the reflectivity of the mirror. A rule of thumb is that approximately 2% reflectivity is lost per Å of surface roughness on the substrate. These requirements significantly increase the cost and fabrication time for EUV optics. This is especially true when dealing with non-conventional shapes such as toroids and fly-eye mirrors. Here we present a spin-on-glass process capable of generating super-polished parts from inexpensive substrates. The method is used to render complex diamond-turned optics compatible for use in the EUV regime. The method is described in detail and experimental results are presented demonstrating the effectiveness of the process. Issues of figure control are also discussed.

Paper Details

Date Published: 12 February 2008
PDF: 5 pages
Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 68830F (12 February 2008); doi: 10.1117/12.769625
Show Author Affiliations
Farhad Salmassi, Lawrence Berkeley National Lab. (United States)
Christopher N. Anderson, Univ. of California, Berkeley (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
Patrick P. Naulleau, Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 6883:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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