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Proceedings Paper

Toward sub-10-nm resolution zone plates using the overlay nanofabrication processes
Author(s): Weilun Chao; Erik H. Anderson; Peter Fischer; Dong-Hyun Kim
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Paper Abstract

Soft x-ray zone plate microscopy has proven to be a valuable imaging technique for nanoscale studies. It complements nano-analytic techniques such as electron and scanning probe microscopies. One of its key features is high spatial resolution. We developed an overlay nanofabrication process which allows zone plates of sub-20 nm zone widths to be fabricated. Zone plates of 15 nm outer zones were successfully realized using this process, and sub-15 nm resolution was achieved with these zone plates. We extend the overlay process to fabricating zone plates of 12 nm outer zones, which is expected to achieve 10 nm resolution. In addition, we have identified a pathway to realizing sub-10 nm resolution, high efficiency zone plates with tilted zones using the overlay process.

Paper Details

Date Published: 12 February 2008
PDF: 8 pages
Proc. SPIE 6883, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics, 688309 (12 February 2008); doi: 10.1117/12.768878
Show Author Affiliations
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Erik H. Anderson, Lawrence Berkeley National Lab. (United States)
Peter Fischer, Lawrence Berkeley National Lab. (United States)
Dong-Hyun Kim, Chungbuk National Univ. (South Korea)

Published in SPIE Proceedings Vol. 6883:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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