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Proceedings Paper

Nitrogen-ion-implanted planar optical waveguides in Er-doped tellurite glass: fabrication and characterization
Author(s): I. Bányász; S. Berneschi; I. Cacciari; M. Fried; T. Lohner; G. Nunzi-Conti; F. Pászti; S. Pelli; P. Petrik; G. C. Righini; A. Watterich; Z. Zolnai
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Paper Abstract

Fabrication of channel waveguides in Er-doped tungsten-tellurite glasses was recently demonstrated. In order to get a deeper understanding of the process and to optimize the characteristics of the waveguides, we fabricated a set of planar waveguides, each of 7 mm × 7 mm lateral dimensions, in an Er-doped tellurite glass sample by implantation of 1.5 MeV nitrogen ions. Doses of the implanting ions ranged from 1 · 1016 to 8 · 1016 ions/cm2. The samples were studied using interference phase contrast microscopy (Interphako), m-line spectroscopy and spectroscopic ellipsometry. The results show that a barrier layer of reduced refractive index was created around the range of the implanted ions at every dose. It is hoped that combination of the results obtained in these experiments with simulations for channel waveguides will make it possible to optimize ion-implanted fabrication of integrated optical components in this tellurite glass.

Paper Details

Date Published: 5 February 2008
PDF: 9 pages
Proc. SPIE 6890, Optical Components and Materials V, 68901A (5 February 2008); doi: 10.1117/12.768507
Show Author Affiliations
I. Bányász, Research Institute of Solid State Physics and Optics (Hungary)
S. Berneschi, Nello Carrara Institute of Applied Physics (Italy)
I. Cacciari, Nello Carrara Institute of Applied Physics (Italy)
M. Fried, Research Institute for Technical Physics and Materials Science (Hungary)
T. Lohner, Research Institute for Technical Physics and Materials Science (Hungary)
G. Nunzi-Conti, Enrico Fermi Ctr. for Study and Research (Italy)
Nello Carrara Institute of Applied Physics (Italy)
F. Pászti, Research Institute for Particle and Nuclear Physics (Hungary)
S. Pelli, Nello Carrara Institute of Applied Physics (Italy)
P. Petrik, Research Institute for Technical Physics and Materials Science (Hungary)
G. C. Righini, Nello Carrara Institute of Applied Physics (Italy)
A. Watterich, Research Institute of Solid State Physics and Optics (Hungary)
Z. Zolnai, Research Institute for Technical Physics and Materials Science (Hungary)


Published in SPIE Proceedings Vol. 6890:
Optical Components and Materials V
Michel J. F. Digonnet; Shibin Jiang; John W. Glesener; J. Christopher Dries, Editor(s)

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