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Proceedings Paper

A novel method for measuring the coma aberration of lithographic projection optics by relative image displacements at multiple illumination settings
Author(s): Qiongyan Yuan; Xiangzhao Wang; Zicheng Qiu; Fan Wang; Mingying Ma
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Paper Abstract

As the critical dimension shrinks, deterioration of image quality caused by coma aberrations of the lithographic projection optics has become a serious problem in optical lithography. Fast and accurate in-situ measurement techniques for measuring the coma aberration are necessary. In the present paper, we propose a novel method for measuring the coma aberrations of lithographic projection optics by use of a novel mark, which is composed of two fine-segmented phase-shifting gratings and two sufficiently large binary gratings. The coma aberration is extracted from the relative displacements between the phase-shifting gratings and the binary gratings at multiple illumination settings. The PROLITH simulation results show that compared with the TAMIS technique, the measurement accuracy of coma aberration increases by more than 34% under conventional illumination, and the measurement accuracy of low-order coma aberration increases by more than 28% under annular illumination.

Paper Details

Date Published: 21 November 2007
PDF: 7 pages
Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271S (21 November 2007); doi: 10.1117/12.766179
Show Author Affiliations
Qiongyan Yuan, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate School of the Chinese Academy of Sciences (China)
Xiangzhao Wang, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate School of the Chinese Academy of Sciences (China)
Zicheng Qiu, Shanghai Institute of Optics and Fine Mechanics (China)
Graduate School of the Chinese Academy of Sciences (China)
Fan Wang, National Engineering Research Ctr. for Lithographic Equipment (China)
Mingying Ma, National Engineering Research Ctr. for Lithographic Equipment (China)


Published in SPIE Proceedings Vol. 6827:
Quantum Optics, Optical Data Storage, and Advanced Microlithography
Chris A. Mack; Jinfeng Kang; Jun-en Yao; Guangcan Guo; Song-hao Liu; Osamu Hirota; Guofan Jin; Kees A. Schouhamer Immink; Keiji Shono, Editor(s)

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