Share Email Print
cover

Proceedings Paper

Broadband diffuser for an IR illumination system
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

Many applications, both in commercial and defense industries, require uniform diffusion at either a broad wavelength range, or at multiple discrete wavelengths. Currently employed technologies have trade-off's between their ability to control the angular distribution and uniformity of the output beams intensity profile, and the ability to suppress 0th order for the devices in a way that can be volume manufactured to tolerate environmental extremes. At Tessera, we have developed a binary lithography technique which nearly eliminates the 0th order over a much broadened wavelength range, while maintaining much greater control over the angular distribution of the beam. In this paper we describe technology and how it has been applied to the design and manufacture of a top-hat diffuser profile for the wavelengths of 3.95μm and 4.6μm. The procedures used for testing, as well as the test results, are provided courtesy of Aculight Corporation.

Paper Details

Date Published: 22 February 2008
PDF: 10 pages
Proc. SPIE 6912, Practical Holography XXII: Materials and Applications, 69120D (22 February 2008); doi: 10.1117/12.765644
Show Author Affiliations
Robert E. Hutchins, Tessera North America (United States)
Steve Tidwell, Aculight Corp. (United States)
Jessica L. Wargats, Tessera North America (United States)


Published in SPIE Proceedings Vol. 6912:
Practical Holography XXII: Materials and Applications
Hans I. Bjelkhagen; Raymond K. Kostuk, Editor(s)

© SPIE. Terms of Use
Back to Top