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Proceedings Paper

Mask-less lithography for fabrication of optical waveguides
Author(s): M. Dubov; S. R. Natarajan; J. A. R. Williams; I. Bennion
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Paper Abstract

A flexible method for fabricating shallow optical waveguides by using femtosecond laser writing of patterns on a metal coated glass substrate followed by ion-exchange is described. This overcomes the drawbacks of low index contrast and high induced stress in waveguides directly written using low-repetition rate ultrafast laser systems. When compared to conventional lithography, the technique is simpler and has advantages in terms of flexibility in the types of structures which can be fabricated.

Paper Details

Date Published: 15 February 2008
PDF: 8 pages
Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 688110 (15 February 2008); doi: 10.1117/12.762594
Show Author Affiliations
M. Dubov, Aston Univ. (United Kingdom)
S. R. Natarajan, Aston Univ. (United Kingdom)
J. A. R. Williams, Aston Univ. (United Kingdom)
I. Bennion, Aston Univ. (United Kingdom)


Published in SPIE Proceedings Vol. 6881:
Commercial and Biomedical Applications of Ultrafast Lasers VIII
Joseph Neev; Stefan Nolte; Alexander Heisterkamp; Christopher B. Schaffer, Editor(s)

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