Share Email Print
cover

Proceedings Paper

Wafer-fused orientation-patterned GaAs
Author(s): Jin Li; David B. Fenner; Krongtip Termkoa; Mark G. Allen; Peter F. Moulton; Candace Lynch; David F. Bliss; William D. Goodhue
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

The fabrication of thick orientation-patterned GaAs (OP-GaAs) films is reported using a two-step process where an OP-GaAs template with the desired crystal domain pattern was prepared by wafer fusion bonding and then a thick film was grown over the template by low pressure hydride vapor phase epitaxy (HVPE). The OP template was fabricated using molecular beam epitaxy (MBE) followed by thermocompression wafer fusion, substrate removal, and lithographic patterning. On-axis (100) GaAs substrates were utilized for fabricating the template. An approximately 350 μm thick OP-GaAs film was grown on the template at an average rate of ~70 μm/hr by HVPE. The antiphase domain boundaries were observed to propagate vertically and with no defects visible by Nomarski microscopy in stain-etched cross sections. The optical loss at ~2 μm wavelength over an 8 mm long OP-GaAs grating was measured to be no more than that of the semi-insulating GaAs substrate. This template fabrication process can provide more flexibility in arranging the orientation of the crystal domains compared to the Ge growth process and is scalable to quasi-phase-matching (QPM) devices operating from the IR to terahertz frequencies utilizing existing industrial foundries.

Paper Details

Date Published: 13 February 2008
PDF: 8 pages
Proc. SPIE 6875, Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications VII, 68750H (13 February 2008); doi: 10.1117/12.762315
Show Author Affiliations
Jin Li, Univ. of Massachusetts at Lowell (United States)
David B. Fenner, Physical Sciences, Inc. (United States)
Krongtip Termkoa, Univ. of Massachusetts at Lowell (United States)
Mark G. Allen, Physical Sciences, Inc. (United States)
Peter F. Moulton, Physical Sciences, Inc. (United States)
Candace Lynch, Air Force Research Lab. (United States)
David F. Bliss, Air Force Research Lab. (United States)
William D. Goodhue, Univ. of Massachusetts at Lowell (United States)


Published in SPIE Proceedings Vol. 6875:
Nonlinear Frequency Generation and Conversion: Materials, Devices, and Applications VII
Peter E. Powers, Editor(s)

© SPIE. Terms of Use
Back to Top