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Proceedings Paper

Industrial ultrafast internal engraving laser system for anti-counterfeiting applications
Author(s): Eric Mottay; Axel Kupisiewicz; Gerard Detroux; Xavier Costet; Adrian Simmons; Ulisse Vivarelli; Philippe Lemaire; John Lopez
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Paper Abstract

We report on an industrial ultrafast laser system for internal marking and engraving of transparent materials. Current engraving techniques, using nanosecond infrared or UV laser, are either limited to surface marking, or create thermal stress which can lead to fracture of material. Using an infrared ultrafast laser, we describe an industrial equipment able to non-aggressively mark alphanumeric or datamatrices at a high speed, with a high readability. Anti-counterfeiting and normative applications will be presented, as well as integration on a production line.

Paper Details

Date Published: 15 February 2008
PDF: 5 pages
Proc. SPIE 6881, Commercial and Biomedical Applications of Ultrafast Lasers VIII, 68810H (15 February 2008); doi: 10.1117/12.761189
Show Author Affiliations
Eric Mottay, Amplitude Systèmes (France)
Axel Kupisiewicz, Lasea (Belgium)
Gerard Detroux, KST (Belgium)
Xavier Costet, Costet S.A. (France)
Adrian Simmons, TBS (United Kingdom)
Ulisse Vivarelli, SOLOS (Italy)
Philippe Lemaire, Ctr. Spatial de Liège (Belgium)
John Lopez, Univ. Bordeaux (France)

Published in SPIE Proceedings Vol. 6881:
Commercial and Biomedical Applications of Ultrafast Lasers VIII
Joseph Neev; Stefan Nolte; Alexander Heisterkamp; Christopher B. Schaffer, Editor(s)

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