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Proceedings Paper

Realization of SOI submicrometer optical waveguide components
Author(s): Xuejun Xu; Shaowu Chen; Jinzhong Yu; Xiaoguang Tu
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Paper Abstract

Submicrometer channel and rib waveguides based on SOI (Silicon-On-Insulator) have been designed and fabricated with electron-beam lithography and inductively coupled plasma dry etching. Propagation loss of 8.39dB/mm was measured using the cut-back method. Based on these so-called nanowire waveguides, we have also demonstrated some functional components with small dimensions, including sharp 90° bends with radius of a few micrometers, T-branches, directional couplers and multimode interferometer couplers.

Paper Details

Date Published: 8 January 2008
PDF: 9 pages
Proc. SPIE 6838, Optoelectronic Devices and Integration II, 68380L (8 January 2008); doi: 10.1117/12.760224
Show Author Affiliations
Xuejun Xu, Institute of Semiconductors (China)
Shaowu Chen, Institute of Semiconductors (China)
Jinzhong Yu, Institute of Semiconductors (China)
Xiaoguang Tu, Institute of Semiconductors (China)


Published in SPIE Proceedings Vol. 6838:
Optoelectronic Devices and Integration II
Xuping Zhang; Hai Ming; Maggie Yihong Chen, Editor(s)

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