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Proceedings Paper

Study on in-situ measuring method for average stress gradient of a MEMS film
Author(s): Hua Rong; Ming Wang
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Paper Abstract

An electrostatically actuated in-situ measuring method for average stress gradient of a MEMS film was proposed based on pull-in voltages of a set of cantilevers. The key of the measuring method is to realize accurate calculation of pull-in voltages of the cantilevers. To increase the accuracy of the measurement, bending of the cantilevers along the width direction due to the stress gradient was considered. Actual simulations indicate that the calculating speed and the accuracy of the measuring method are ideal, and the method can be applied to in-situ measurement.

Paper Details

Date Published: 9 January 2008
PDF: 7 pages
Proc. SPIE 6800, Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV, 680020 (9 January 2008); doi: 10.1117/12.759463
Show Author Affiliations
Hua Rong, Nanjing Normal Univ. (China)
Ming Wang, Nanjing Normal Univ. (China)


Published in SPIE Proceedings Vol. 6800:
Device and Process Technologies for Microelectronics, MEMS, Photonics, and Nanotechnology IV
Hark Hoe Tan; Jung-Chih Chiao; Lorenzo Faraone; Chennupati Jagadish; Jim Williams; Alan R. Wilson, Editor(s)

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