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Proceedings Paper

Research on structural properties of ZnO thin films deposited on different substrates
Author(s): Xi-ming Chen; Yu-ming Xue; Chun-hua Yu; Jun-Ping Zhang; Chang-feng Fu; Xia Chen; Hua-peng Li
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Paper Abstract

In this article, ZnO thin films were deposited on different substrates, including glass, p-Si (100) and n-Si (111) by radio frequency (RF) magnetron sputtering technique. By changing substrate temperature and sputtering power, the influence of the sputtering rate was studied on structural properties of ZnO films. The film structural properties of the crystal phase, the surface morphology and the thickness were characterized by D/MAX-2200 XRD, JEOL JSM-6700F ESEM and AMBIOS XP-2 step meter respectively. The results showed that the films deposited on p-Si (100) substrates were preferred c-axis orientations, and their surfaces were smooth and compact when the substrate temperature was 300 Centigrade degrees.

Paper Details

Date Published: 26 November 2007
PDF: 5 pages
Proc. SPIE 6829, Advanced Materials and Devices for Sensing and Imaging III, 68290O (26 November 2007); doi: 10.1117/12.759269
Show Author Affiliations
Xi-ming Chen, Tianjin Univ. of Technology (China)
Yu-ming Xue, Tianjin Univ. of Technology (China)
Chun-hua Yu, Tianjin Univ. of Technology (China)
Jun-Ping Zhang, Tianjin Univ. of Technology (China)
Chang-feng Fu, Tianjin Univ. of Technology (China)
Xia Chen, Tianjin Univ. of Technology (China)
Hua-peng Li, Tianjin Univ. of Technology (China)


Published in SPIE Proceedings Vol. 6829:
Advanced Materials and Devices for Sensing and Imaging III
Anbo Wang; Yimo Zhang; Yukihiro Ishii, Editor(s)

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