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Proceedings Paper

Fabrication of CoFe nanostructures by holographic lithography
Author(s): Zijun Zhang; Xudi Wang; Ying Liu; Yuxian Guo; Yilin Hong; Xiangdong Xu; Shaojun Fu; Pengshou Xu; Jie Wang; Jianwang Cai
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Paper Abstract

A novel process that combines interference lithography and ion beam etching is presented for fabrication of magnetic submicron structures and nanostructures in this paper. Instead of an antireflective coating, vertical standing wave patterns were removed using oxygen descumming process. A series of magnetic submicronmeter structures were fabricated on Co0.9Fe0.1 films by this technique. Fabrication of magnetic nanostructures was performed by using a high exposure dose and modifications in optimized development conditions. A thin Au film was deposited on the sidewall of the magnetic nanostructures to avoid the oxidation of Co and Fe. The effect of this method was confirmed by X-ray photoelectron spectroscopy (XPS). Hysteresis loops measured by a highly sensitive superconducting quantum interference device (SQUID) technique show the different magnetic properties of the magnetic patterns with different critical dimensions.

Paper Details

Date Published: 4 January 2008
PDF: 6 pages
Proc. SPIE 6831, Nanophotonics, Nanostructure, and Nanometrology II, 68311B (4 January 2008); doi: 10.1117/12.757524
Show Author Affiliations
Zijun Zhang, Univ. of Science and Technology of China (China)
Xudi Wang, Univ. of Science and Technology of China (China)
Ying Liu, Univ. of Science and Technology of China (China)
Yuxian Guo, Univ. of Science and Technology of China (China)
Yilin Hong, Univ. of Science and Technology of China (China)
Xiangdong Xu, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)
Pengshou Xu, Univ. of Science and Technology of China (China)
Jie Wang, Univ. of Science and Technology of China (China)
Jianwang Cai, Institute of Physics and Ctr. of Condensed Matter Physics (China)


Published in SPIE Proceedings Vol. 6831:
Nanophotonics, Nanostructure, and Nanometrology II
Xing Zhu; Stephen Y. Chou; Yasuhiko Arakawa, Editor(s)

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