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Proceedings Paper

Simulation of optical surfaces and their PSD study
Author(s): Shuyi Gan; Yinhe Bao; Yilin Hong; Xiangdong Xu; Ying Liu; Shaojun Fu
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Paper Abstract

The performance of a optical component is greatly dependent on its surfaces. There are many ways to measure and evaluate a surface so far, but actually no one knows exactly what a "real" surface likes, and thus makes some measurement unexplainable. This paper develops a way to construct various synthetic surfaces. Referred to actual AFM measurement, regular or irregular surfaces can be created and studied. Bumps, scratches, granules, profile errors and other construction elements can be added to form a very complicated virtual surface. The number, size and distribution of these elements can be changed, and if necessary, the surface roughness can be controlled in a specialized range. As these surfaces are created synthetically, we know exactly what construction these surface contain. The height data of created virtual surfaces can be transferred into the file that AFM instrument can read and handle. As a typical example, a very complicated surface is created step by step in this paper, and its PSD for each step are calculated. This process mikes it very clear how the surface component element affect its PSD function, and is benefit to our better understanding of real surface construction.

Paper Details

Date Published: 4 January 2008
PDF: 7 pages
Proc. SPIE 6831, Nanophotonics, Nanostructure, and Nanometrology II, 68310G (4 January 2008); doi: 10.1117/12.757332
Show Author Affiliations
Shuyi Gan, Univ. of Science and Technology of China (China)
Hefei Univ. of Technology (China)
Yinhe Bao, Hefei Univ. of Technology (China)
Yilin Hong, Univ. of Science and Technology of China (China)
Xiangdong Xu, Univ. of Science and Technology of China (China)
Ying Liu, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6831:
Nanophotonics, Nanostructure, and Nanometrology II
Xing Zhu; Stephen Y. Chou; Yasuhiko Arakawa, Editor(s)

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