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Proceedings Paper

Free-standing SU-8 gratings fabricated by sacrificial layer-assisted UV curing imprint
Author(s): Xudi Wang; Zijun Zhang; Liangjin Ge; Yanlin Liao; Shaojun Fu
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Paper Abstract

We present results on the nanofabrication of high density patterns in SU-8 resist, based on nanoimprinting combined with UV curing. The bilayer process using PMMA as sacrificial layer was developed to release the SU-8 layer to form three dimensional structures. The SU-8 displays excellent imprint property and well defined patterns are achieved at at low temperature, low pressure after demolding process. Using this technology, 300nm period SU-8 subwavelengh gratings and nanochannels were fabricated on flat substrate with good fidelity. This sacrificial layer-assisted UV curing imprint technology offers versatility and flexibility to stack polymer layers and sealed fluidic channels.

Paper Details

Date Published: 21 November 2007
PDF: 6 pages
Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68271T (21 November 2007); doi: 10.1117/12.757290
Show Author Affiliations
Xudi Wang, Hefei Univ. of Technology (China)
Zijun Zhang, Univ. of Science and Technology of China (China)
Liangjin Ge, Univ. of Science and Technology of China (China)
Yanlin Liao, Anhui Univ. (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6827:
Quantum Optics, Optical Data Storage, and Advanced Microlithography
Chris A. Mack; Jinfeng Kang; Jun-en Yao; Guangcan Guo; Song-hao Liu; Osamu Hirota; Guofan Jin; Kees A. Schouhamer Immink; Keiji Shono, Editor(s)

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