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Proceedings Paper

Generation of phase-shift patterns in the optical far field and its applications
Author(s): Wei-Feng Hsu; Yu-Weng Chen; Yuan-Hong Su
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Paper Abstract

We introduce and compare two methods to produce the phase-shift patterns, which are widely generated in the near-field lithography, in the optical far field. The key component of the two methods is a phase-only diffractive optical element, a similar function found in the maskless lithography. The technique to produce a smaller feature size was a major improvement beyond the diffraction limit.

Paper Details

Date Published: 4 January 2008
PDF: 8 pages
Proc. SPIE 6832, Holography and Diffractive Optics III, 68320J (4 January 2008); doi: 10.1117/12.757054
Show Author Affiliations
Wei-Feng Hsu, National Taipei Univ. of Technology (Taiwan)
Yu-Weng Chen, National Tsing Hua Univ. (Taiwan)
Yuan-Hong Su, National Taipei Univ. of Technology (Taiwan)


Published in SPIE Proceedings Vol. 6832:
Holography and Diffractive Optics III
Yunlong Sheng; Dahsiung Hsu; Chongxiu Yu, Editor(s)

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