Share Email Print

Proceedings Paper

Generation of phase-shift patterns in the optical far field and its applications
Author(s): Wei-Feng Hsu; Yu-Weng Chen; Yuan-Hong Su
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We introduce and compare two methods to produce the phase-shift patterns, which are widely generated in the near-field lithography, in the optical far field. The key component of the two methods is a phase-only diffractive optical element, a similar function found in the maskless lithography. The technique to produce a smaller feature size was a major improvement beyond the diffraction limit.

Paper Details

Date Published: 4 January 2008
PDF: 8 pages
Proc. SPIE 6832, Holography and Diffractive Optics III, 68320J (4 January 2008); doi: 10.1117/12.757054
Show Author Affiliations
Wei-Feng Hsu, National Taipei Univ. of Technology (Taiwan)
Yu-Weng Chen, National Tsing Hua Univ. (Taiwan)
Yuan-Hong Su, National Taipei Univ. of Technology (Taiwan)

Published in SPIE Proceedings Vol. 6832:
Holography and Diffractive Optics III
Yunlong Sheng; Dahsiung Hsu; Chongxiu Yu, Editor(s)

© SPIE. Terms of Use
Back to Top