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Proceedings Paper

Quantum key distribution networks layer model
Author(s): Hao Wen; Zheng-fu Han; Pei-lin Hong; Guang-can Guo
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Paper Abstract

Quantum Key Distribution (QKD) networks allow multiple users to generate and share secret quantum keys with unconditional security. Although many schemes of QKD networks have been presented, they are only concentrated on the system realization and physical implementations. For the complete practical quantum network, a succinct theoretic model that systematically describes the working processes from physical schemes to key process protocols, from network topology to key management, and from quantum communication to classical communication is still absent. One would hope that research and experience have shown that there are certain succinct model in the design of communication network. With demonstration of the different QKD links and the four primary types of quantum networks including probability multiplexing, wavelength multiplexing, time multiplexing and quantum multiplexing, we suggest a layer model for QKD networks which will be compatible with different implementations and protocols. We divide it into four main layers by their functional independency while defining each layer's services and responsibilities in detail, orderly named quantum links layer, quantum networks layer, quantum key distribution protocols process layer, and keys management layer. It will be helpful for the systematic design and construction of real QKD networks.

Paper Details

Date Published: 26 November 2007
PDF: 7 pages
Proc. SPIE 6827, Quantum Optics, Optical Data Storage, and Advanced Microlithography, 68270N (26 November 2007); doi: 10.1117/12.756090
Show Author Affiliations
Hao Wen, Univ. of Science and Technology of China (China)
Zheng-fu Han, Univ. of Science and Technology of China (China)
Pei-lin Hong, Univ. of Science and Technology of China (China)
Guang-can Guo, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 6827:
Quantum Optics, Optical Data Storage, and Advanced Microlithography
Chris A. Mack; Jinfeng Kang; Jun-en Yao; Guangcan Guo; Song-hao Liu; Osamu Hirota; Guofan Jin; Kees A. Schouhamer Immink; Keiji Shono, Editor(s)

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