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Proceedings Paper

Design of objective lenses to extend the depth of field based on wavefront coding
Author(s): Tingyu Zhao; Zi Ye; Wenzi Zhang; Weiwei Huang; Feihong Yu
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Paper Abstract

Wavefront coding extended the depth of field to a great extent with simpler structure compared to confocal microscope. With cubic phase mask (CPM) employed in the STOP of the objective lens, blurred images will be obtained in charge coupled device (CCD), which will be restored to sharp images by Wiener filter. We proposed that one CPM is used in one microscope although there are different objective lenses with different power indices. The microscope proposed here is the wavefront coding one when the CPM is used in the STOP; while it is the traditional one when a plane plate is used in the STOP. Firstly, make the STOP in the last surface of the lens, and then add a plane plate at the STOP with the same material and the same center thickness of the CPM. Traditional objective lenses are designed, based on which wavefront coding system will be designed with the plane plate replaced by a CPM. Secondly, the parameters of CPMs in different objective lenses are optimized to certain ranges based on metric function of stability of modulation transfer function (MTF). The optimal parameter is chosen from these ranges. A set of objective lenses is designed as an example with one CPM. The simulation results shows that the depth of field of 4X, 10X, 40X, 60X and 100X objective lenses with the same CPM can reach to 400um, 40um, 24um, 16um and 2um respectively, which is much larger than 55.5um, 8.5um, 1um, 0.4um and 0.19um of the traditional ones.

Paper Details

Date Published: 28 November 2007
PDF: 8 pages
Proc. SPIE 6834, Optical Design and Testing III, 683414 (28 November 2007); doi: 10.1117/12.756051
Show Author Affiliations
Tingyu Zhao, Zhejiang Univ. (China)
Zi Ye, Zhejiang Univ. (China)
Wenzi Zhang, Zhejiang Univ. (China)
Weiwei Huang, Zhejiang Univ. (China)
Feihong Yu, Zhejiang Univ. (China)

Published in SPIE Proceedings Vol. 6834:
Optical Design and Testing III
Yongtian Wang; Theo T. Tschudi; Jannick P. Rolland; Kimio Tatsuno, Editor(s)

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