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Proceedings Paper

Process investigation of a-Si:H thin films prepared by DC magnetron sputtering
Author(s): Chunling Liu; Chunwu Wang; Yanping Yao; Yuxia Wang; Baoxue Bo
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Paper Abstract

Hydrogenated amorphous silicon (a-Si:H) thin films have been prepared by DC magnetron sputtering, and the effect of sputtering power, the hydrogen flow rate on deposition rate and the optical properties of a-Si:H thin films have been investigated. The hydrogen content (CH) of the films was calculated by Fourier transform infrared (FTIR) spectroscopy method, the maximum CH was obtained at 11at. %,and a bandgap of a-Si:H thin films was changed from 1.43 to 2.25 eV with different CH. It was found that the refractive index (n) and extinction coefficient (k) of the prepared films decreased with the increase of CH. The results provided experimental basis for preparing a-Si:H thin films with special performance and structure .

Paper Details

Date Published: 4 January 2008
PDF: 8 pages
Proc. SPIE 6825, Lasers in Material Processing and Manufacturing III, 682514 (4 January 2008); doi: 10.1117/12.754917
Show Author Affiliations
Chunling Liu, Changchun Univ. of Science and Technology (China)
Jilin Normal Univ. (China)
Chunwu Wang, Jilin Normal Univ. (China)
Yanping Yao, Changchun Univ. of Science and Technology (China)
Jilin Normal Univ. (China)
Yuxia Wang, Changchun Univ. of Science and Technology (China)
Baoxue Bo, Changchun Univ. of Science and Technology (China)


Published in SPIE Proceedings Vol. 6825:
Lasers in Material Processing and Manufacturing III
ShuShen Deng; Akira Matsunawa; Xiao Zhu, Editor(s)

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