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Proceedings Paper

Plasmonic nanostructures made from aluminum fabricated by EUV interference lithography
Author(s): Y. Ekinci; H. H. Solak; C. David; J. F. Löffler
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Paper Abstract

Extreme Ultra Violet (EUV) interference lithography was employed for fabrication of large-area, sub-100 nm scale Al nanoparticles as well as free-standing aluminum hole arrays. We studied the optical properties of the fabricated Al nanostructures. The marked difference in Al, compared to Au and Ag, is that its plasmon resonances lie in the UV range. Thus, the high-frequency plasmon resonance of Al nanostructures enables the extending of plasmonic research into the UV range and opens up new possible applications of plasmonics.

Paper Details

Date Published: 10 October 2007
PDF: 8 pages
Proc. SPIE 6717, Optomechatronic Micro/Nano Devices and Components III, 67170P (10 October 2007); doi: 10.1117/12.754350
Show Author Affiliations
Y. Ekinci, ETH Zurich (Switzerland)
H. H. Solak, Paul Scherrer Institute (Switzerland)
C. David, Paul Scherrer Institute (Switzerland)
J. F. Löffler, ETH Zurich (Switzerland)

Published in SPIE Proceedings Vol. 6717:
Optomechatronic Micro/Nano Devices and Components III
Lixin Dong; Yoshitada Katagiri; Eiji Higurashi; Hiroshi Toshiyoshi; Yves-Alain Peter, Editor(s)

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