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Proceedings Paper

Thin film thickness profile measurement using an interferometric surface profiler
Author(s): Katsuichi Kitagawa
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Paper Abstract

The technique of surface profile measurement using white-light interferometry is widely used in industry. However, its application to transparent thin films has been limited to date because the reflection signals from the front and back surfaces are mixed and must be separated in order to obtain correct measurements. This paper introduces four of our recent developments in this application field: 1) profiling of a thick transparent film, 2) profiling of a thin transparent film, 3) thickness profiling of a freestanding film, and 4) simultaneous measurement of the thickness and refractive index of a freestanding film.

Paper Details

Date Published: 10 October 2007
PDF: 12 pages
Proc. SPIE 6716, Optomechatronic Sensors and Instrumentation III, 671607 (10 October 2007); doi: 10.1117/12.754178
Show Author Affiliations
Katsuichi Kitagawa, Toray Engineering Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 6716:
Optomechatronic Sensors and Instrumentation III

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