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Proceedings Paper

Revisiting mechanisms of molecular contamination induced laser optic damage
Author(s): John S. Canham
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Paper Abstract

A revision of a theoretical mechanism proposed last year based upon the known chemical and physical interactions of laser radiation, fused silica, aromatic molecules and environmental factors will be presented, as relates to other proposed mechanisms. This paper specifically addresses the interaction of toluene with 1064nm laser radiation as related to the formation of benzyl radical, and to free radical photochemistry of toluene. This will address specifically, the effects of oxygen and water in the system, the effects of hydroxyl radical in the system, the interpretation of the XPS spectra of laser damaged silica in the presence and absence of aromatic hydrocarbons and the relationship of these points to the photochemistry of silica.

Paper Details

Date Published: 20 December 2007
PDF: 11 pages
Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200M (20 December 2007); doi: 10.1117/12.753588
Show Author Affiliations
John S. Canham, ATK Space Inc. (United States)


Published in SPIE Proceedings Vol. 6720:
Laser-Induced Damage in Optical Materials: 2007
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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