Share Email Print
cover

Proceedings Paper

Influence of process conditions on the optical properties of HfO2/SiO2 coatings for high-power laser coatings
Author(s): B. Langdon; D. Patel; E. Krous; J. J. Rocca; C. S. Menoni; F. Tomasel; S. Kholi; P. R. McCurdy; Peter Langston; Albert Ogloza
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

We investigate the variations that occur with changes in the number of layers and with the use of the assist beam main and assist beam energy on the morphology of HfO2/SiO2 quarter wave stacks deposited by dual ion beam sputtering. We show how the addition of sequential HfO2/SiO2 bilayers, up to eight, affects the surface roughness and micro-crystallinity of the top HfO2 layer. We also show that use of the assist source significantly smooths the surface while simultaneously reducing microcrystallinity. The HfO2/SiO2 structures are very robust and can withstand fluences in excess of 3 J/cm2 generated by 1ps pulses from a chirped amplified Ti:Sapphire laser.

Paper Details

Date Published: 16 January 2008
PDF: 8 pages
Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200X (16 January 2008); doi: 10.1117/12.753027
Show Author Affiliations
B. Langdon, Colorado State Univ. (United States)
D. Patel, Colorado State Univ. (United States)
E. Krous, Colorado State Univ. (United States)
J. J. Rocca, Colorado State Univ. (United States)
C. S. Menoni, Colorado State Univ. (United States)
F. Tomasel, Advanced Energy Inc. (United States)
Colorado State Univ. (United States)
S. Kholi, Colorado State Univ. (United States)
P. R. McCurdy, Colorado State Univ. (United States)
Peter Langston, Naval Air Warfare Ctr. (United States)
Albert Ogloza, Naval Air Warfare Ctr. (United States)


Published in SPIE Proceedings Vol. 6720:
Laser-Induced Damage in Optical Materials: 2007
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

© SPIE. Terms of Use
Back to Top