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Proceedings Paper

Laser damage of silica and hafnia thin films made with different deposition technologies
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Paper Abstract

A comparative study is made on the laser damage resistance of monolayers coatings made with different technologies. HfO2 and SiO2 thin films have been deposited on fused silica substrates with Dual Ion Beam Sputtering, Electron Beam Deposition (with and without Ion Assistance) and Reactive Low Voltage Ion Plating technologies. The laser damage thresholds of these coatings have been determined at 1064nm and 355nm using a nanosecond pulsed YAG laser, and a 1-on-1 test procedure.

Paper Details

Date Published: 20 December 2007
PDF: 8 pages
Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200S (20 December 2007); doi: 10.1117/12.752952
Show Author Affiliations
Laurent Gallais, Institut Fresnel, CNRS (France)
Jérémie Capoulade, Institut Fresnel, CNRS (France)
Jean-Yves Natoli, Institut Fresnel, CNRS (France)
Mireille Commandré, Institut Fresnel, CNRS (France)
Michel Cathelinaud, Institut Fresnel, CNRS (France)
Cian Koc, Institut Fresnel, CNRS (France)
Michel Lequime, Institut Fresnel, CNRS (France)

Published in SPIE Proceedings Vol. 6720:
Laser-Induced Damage in Optical Materials: 2007
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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