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Proceedings Paper

The exponential fitting of optical threshold and analyses of testing errors
Author(s): Dawei Li; Jianda Shao; Yuanan Zhao; Kui Yi; Hongji Qi
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Paper Abstract

The effect of irradiated spot size and number of sites exposed for each pulse energy or power density on damage possibility is studied. It is shown that larger irradiating spot size and more sites tested for each pulse energy or power density, more accurate damage data could be obtained. Also the effect of defect distribution should be taken into account and it also affects the accuracy of damage threshold determination. A new method, exponential fitting, is described and it yields more accurate damage onset. And it is derived from but suitable to more than all-degeneration model.

Paper Details

Date Published: 18 December 2007
PDF: 7 pages
Proc. SPIE 6720, Laser-Induced Damage in Optical Materials: 2007, 67200B (18 December 2007); doi: 10.1117/12.752814
Show Author Affiliations
Dawei Li, Shanghai Institute of Optics and Fine Mechanics (China)
Jianda Shao, Shanghai Institute of Optics and Fine Mechanics (China)
Yuanan Zhao, Shanghai Institute of Optics and Fine Mechanics (China)
Kui Yi, Shanghai Institute of Optics and Fine Mechanics (China)
Hongji Qi, Shanghai Institute of Optics and Fine Mechanics (China)


Published in SPIE Proceedings Vol. 6720:
Laser-Induced Damage in Optical Materials: 2007
Gregory J. Exarhos; Arthur H. Guenther; Keith L. Lewis; Detlev Ristau; M. J. Soileau; Christopher J. Stolz, Editor(s)

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