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Proceedings Paper

Simple and effective algorithm of inorganic resist As2S3 development simulation
Author(s): D. V. Myagkov
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Paper Abstract

A simple and effective method of computer simulation of inorganic photoresist based on chalcogenide glass As2S3 development is proposed. The photoresist is exposed by interference photolithography, which is a promising technology for large-scale producing of subwavelength surface relief grating. The influence of exposure and photoresist parameters was investigated in order to produce periodical structure with a period of almost half of exposing wavelength.

Paper Details

Date Published: 28 June 2007
PDF: 9 pages
Proc. SPIE 6732, International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies, 67321V (28 June 2007); doi: 10.1117/12.752228
Show Author Affiliations
D. V. Myagkov, Ioffe Physico-Technical Institute (Russia)


Published in SPIE Proceedings Vol. 6732:
International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies

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