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Proceedings Paper

Laser writing systems and technologies for fabrication of binary and continuous relief diffractive optical elements
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Paper Abstract

Precision laser-writing systems operated in polar coordinates and direct writing technologies for fabrication of diffractive optical elements and computer generated holograms have been described. These systems can manufacture continuous-relief and binary microstructures with minimum feature sizes of less than 0.6 μm and laser beam positioning accuracy of 0.05 μm over 300-mm substrates. Hardware and software of the system permit to write on different types of photosensitive and thermal recording materials. Several examples of fabricated diffractive elements have been presented.

Paper Details

Date Published: 17 July 2007
PDF: 10 pages
Proc. SPIE 6732, International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies, 67320X (17 July 2007); doi: 10.1117/12.751930
Show Author Affiliations
A. G. Poleshchuk, Institute of Automation and Electrometry (Russia)
V. P. Korolkov, Institute of Automation and Electrometry (Russia)


Published in SPIE Proceedings Vol. 6732:
International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies

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