Results are presented from experimental and theoretical studies of current, dose and energy characteristics of ion beams in the process of ion implantation from pulsed laser plasma containing multicharged ions in an external accelerating electric field. Physical processes in expanding laser-produced plasma are simulated by the particle-in-cell method. The model predicts energy spectra of implanted ions depending on the operation conditions. It has been found both experimentally and theoretically that the current characteristics of the laser plasma expanding from the target to the substrate depend substantially on the time at which the high-voltage accelerating pulse is applied. It is established, that for an effective utilization of double-charged ions in the implantation process it is necessary to realize fast enough turning-on of an external electric field after the laser action on the target. The initiation of high voltage pulse with 50 kV amplitude 0.5 μs after the laser pulse allows realizing the implantation of ions with energy near the 100 keV level. Comparison of experimental and calculated depth distributions shows that the developed model quite adequately describes formation of high-energy components of ion beam which provides the defect formation and alloying of the deep layers of the substrate.

Date Published: 28 June 2007
PDF: 9 pages
Proc. SPIE 6732, International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies, 67320M (28 June 2007); doi: 10.1117/12.751908

Published in SPIE Proceedings Vol. 6732:
International Conference on Lasers, Applications, and Technologies 2007: Laser-assisted Micro- and Nanotechnologies
Vladislav Panchenko; Oleg Louchev; Sergei Malyshev, Editor(s)