Share Email Print

Proceedings Paper

Progress report on a 14.4-nm micro-exposure tool based on a laser-produced-plasma: debris mitigation system results and other issues
Author(s): S. Bollanti; D. Amodio; A. Conti; P. Di Lazzaro; F. Flora; L. Mezi; D. Murra; A. Torre; C. E. Zheng; D. Garoli; M. G. Pelizzo; P. Nicolosi; V. Mattarello; V. Rigato; A. Gerardino
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Within a National Project on nanotechnologies, a Micro-Exposure Tool (MET) for projection lithography at 14.4 nm, based on a laser-produced plasma source, is being developed at the Frascati ENEA Center. The choice of this "exotic" wavelength is due to the higher efficiency of a Debris Mitigation System (DMS) working in the interval of approximately 14 nm < λ < 15 nm. It has to be noted that Mo/Si multilayer mirrors (MLM) can still have a high reflectivity also at these wavelengths. The solid-tape-target laser-generated plasma is driven by a XeCl excimer laser, with an optimized intensity of about 3•1010 W/cm2, generating an extreme ultraviolet (EUV) source with a diameter of about 0.2 mm. Clearly, this kind of source emits a lot of debris (both atomic and particulate types) and the 7-cm-far collector mirror must be protected against them. The paper is mostly devoted to the accurate and systematic study of these debris and to their reduction. The results of mitigation efficiency obtained with a DMS prototype are very encouraging and lead to the design and patenting of its improved version.

Paper Details

Date Published: 2 October 2007
PDF: 12 pages
Proc. SPIE 6703, Ultrafast X-Ray Sources and Detectors, 670308 (2 October 2007); doi: 10.1117/12.751442
Show Author Affiliations
S. Bollanti, Ente per le Nuove Tecnologie, l'Energia e l'Ambiente (Italy)
D. Amodio, ENEA guest (Italy)
A. Conti, Cilea (Italy)
P. Di Lazzaro, ENEA (Italy)
F. Flora, ENEA (Italy)
L. Mezi, ENEA (Italy)
D. Murra, ENEA (Italy)
A. Torre, ENEA (Italy)
C. E. Zheng, El. En. S.p.A. (Italy)
D. Garoli, Univ. degli Studi di Padova (Italy)
M. G. Pelizzo, Univ. degli Studi di Padova (Italy)
P. Nicolosi, Univ. degli Studi di Padova (Italy)
V. Mattarello, Istituto Nazionale di Fisica Nucleare (Italy)
Media Lario Technologies (Italy)
V. Rigato, Instituto Nazionale di Fisica Nucleare (Italy)
Media Lario Technologies (Italy)
A. Gerardino, Consiglio Nazionale delle Ricerche (Italy)

Published in SPIE Proceedings Vol. 6703:
Ultrafast X-Ray Sources and Detectors
Zenghu Chang; George A. Kyrala; Jean-Claude Kieffer, Editor(s)

© SPIE. Terms of Use
Back to Top